'Developing Products and Patents with TRIZ' 18 - 20 March 2019
Developing Products and Patents with TRIZ
Enhancing Invention and Innovation
An exciting, informative and invaluable workshop that will give inventors, engineers, scientists and patent professionals the tools with which to derive greater value from intellectual property.
- Systematically create novel concepts to make strong patents
- Generate more ideas to broaden patents, protecting your products' future development
- Identify new invention opportunities
- Ring-fence patents (your own or your competitors'!)
- Leapfrog existing patents to develop the next generation
- Circumvent your competitors' patents to get freedom to operate (without involving lawyers)
- Quickly read and understand patents
BENEFITS OF THE TRIZ APPROACH
TRIZ is the ideal toolkit for developing or circumventing patents. TRIZ provides a clear method of identifying the strengths and weaknesses of current products (yours and the competition!).
TRIZ will give you a path to develop your inventions in a systematic way. TRIZ will help you to learn to predict how inventions are likely to evolve, enabling to you develop a strong patent portfolio of your own inventions, and leapfrog or ring-fence your competitorsâ€™ patents.
An introduction to how TRIZ thinking and the TRIZ tools can help us think clearly, and how to develop an intelligent patent strategy. The Ideal Outcome is used to uncover and identify all unmet needs for a new invention, and Thinking in Time and Scale is used to chart the past, present and future of our inventions: helping us uncover future opportunities for and threats to our intellectual property.
We understand how the TRIZ tools for understanding and solving Contradictions help us understand patents and see new opportunities for creating clever inventions, and the Effects database can help us develop new inventions using proven technology.
TRIZ is unique in that it is based upon patent analysis. The TRIZ Tools are perfectly suited to circumvent and strengthen patents.
Who should attend
- Business, Technical and Engineering Managers;
- R&D personnel, researchers, directors.